DocumentCode :
2411956
Title :
Cycling induced degradation of a 65nm FPGA flash memory switch
Author :
Schmid, Ben A. ; Jia, James Yingbo ; Wolfman, Jonathan ; Wang, Yu ; Dhaoui, Fethi ; Tseng, Huan-Chung ; Kim, Sung-Rae ; Lee, Kin-Sing ; Liu, Patty ; Han, Kyung Joon ; Hu, Chenming
Author_Institution :
Actel Corp., Mountain View, CA, USA
fYear :
2010
fDate :
17-21 Oct. 2010
Firstpage :
92
Lastpage :
94
Abstract :
We present a study of cycling induced degradation of a two transistor Flash memory cell with a shared floating gate. The cell directly serves as a configurable interconnection switch in a Field Programmable Gate Array (FPGA) fabricated with a 65 nm embedded-Flash process. By optimizing the poly re-oxidation, LDD implant and spacer module, the cell endurance is significantly improved at both the single cell and 1 Mbit test-array levels.
Keywords :
field programmable gate arrays; flash memories; integrated circuit interconnections; oxidation; semiconductor switches; FPGA flash memory switch; LDD implant; cell endurance; configurable interconnection switch; cycling induced degradation; embedded-flash process; field programmable gate array; poly re-oxidation; shared floating gate; spacer module; test-array levels; transistor flash memory cell; Degradation; Electron traps; Field programmable gate arrays; Logic gates; Nonvolatile memory; Programming; Switches;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International
Conference_Location :
Stanford Sierra, CA
ISSN :
1930-8841
Print_ISBN :
978-1-4244-8521-5
Type :
conf
DOI :
10.1109/IIRW.2010.5706495
Filename :
5706495
Link To Document :
بازگشت