Title : 
Evaluation of x-ray irradiation on 65nm Multi-Level Cell NOR flash technologies
         
        
            Author : 
Navuduri, Praveen ; Melton, William ; Oen, Andrew ; Eilert, Sean ; Abraham, Chintu ; Wen, Shi-Jie
         
        
            Author_Institution : 
Product Eng., Micron Technol., Folsom, CA, USA
         
        
        
        
        
        
            Abstract : 
In this work, 65nm NOR flash memory is used for an evaluation of data retention and impact on cell charge based on varying levels of exposure to x-ray waves. A sample of 100 fully tested and configured units were programmed with a physical checkerboard pattern (half programmed, half erased) and exposed to conditions found in industrial x-ray stations. Readouts of the data pattern were done at various stages throughout the experiment and a comparison of cell Vt was performed on a population of worst case cells (lowest Vt on programmed cells, highest Vt on erased cells). Data was collected on a bit by bit basis and plotted as a cumulative probability function. Bakes were also performed to introduce any potential defects not seen initially as part of the exposure - and the readout data was collected for this stage as well. Results indicated there is a correlation on the amount of charge gain and loss seen based on the amount of total radiation incident upon the cells in extreme conditions.
         
        
            Keywords : 
NOR circuits; X-ray effects; flash memories; radiation hardening (electronics); NOR flash memory; X-ray irradiation; charge gain; checkerboard pattern; cumulative probability function; data retention; multilevel cell NOR flash technology; readout data; size 65 nm; Data models; Electron traps; Flash memory; Inspection; Manufacturing; Radiation effects; Reliability;
         
        
        
        
            Conference_Titel : 
Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International
         
        
            Conference_Location : 
Stanford Sierra, CA
         
        
        
            Print_ISBN : 
978-1-4244-8521-5
         
        
        
            DOI : 
10.1109/IIRW.2010.5706497