• DocumentCode
    2411969
  • Title

    Evaluation of x-ray irradiation on 65nm Multi-Level Cell NOR flash technologies

  • Author

    Navuduri, Praveen ; Melton, William ; Oen, Andrew ; Eilert, Sean ; Abraham, Chintu ; Wen, Shi-Jie

  • Author_Institution
    Product Eng., Micron Technol., Folsom, CA, USA
  • fYear
    2010
  • fDate
    17-21 Oct. 2010
  • Firstpage
    98
  • Lastpage
    101
  • Abstract
    In this work, 65nm NOR flash memory is used for an evaluation of data retention and impact on cell charge based on varying levels of exposure to x-ray waves. A sample of 100 fully tested and configured units were programmed with a physical checkerboard pattern (half programmed, half erased) and exposed to conditions found in industrial x-ray stations. Readouts of the data pattern were done at various stages throughout the experiment and a comparison of cell Vt was performed on a population of worst case cells (lowest Vt on programmed cells, highest Vt on erased cells). Data was collected on a bit by bit basis and plotted as a cumulative probability function. Bakes were also performed to introduce any potential defects not seen initially as part of the exposure - and the readout data was collected for this stage as well. Results indicated there is a correlation on the amount of charge gain and loss seen based on the amount of total radiation incident upon the cells in extreme conditions.
  • Keywords
    NOR circuits; X-ray effects; flash memories; radiation hardening (electronics); NOR flash memory; X-ray irradiation; charge gain; checkerboard pattern; cumulative probability function; data retention; multilevel cell NOR flash technology; readout data; size 65 nm; Data models; Electron traps; Flash memory; Inspection; Manufacturing; Radiation effects; Reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report (IRW), 2010 IEEE International
  • Conference_Location
    Stanford Sierra, CA
  • ISSN
    1930-8841
  • Print_ISBN
    978-1-4244-8521-5
  • Type

    conf

  • DOI
    10.1109/IIRW.2010.5706497
  • Filename
    5706497