DocumentCode
2413550
Title
High power quantum cascade lasers
Author
Gmachl, C. ; Cappasso, F. ; Tredicucci, A. ; Hutchinson, A.L. ; Sivco, D.L. ; Baillargeon, J.N. ; Cho, A.Y.
Author_Institution
AT&T Bell Labs., Murray Hill, NJ, USA
fYear
1998
fDate
4-8 Oct. 1998
Firstpage
225
Lastpage
226
Abstract
High power quantum cascade lasers emitting at /spl lambda//spl sim/8 /spl mu/m are reported that make optimum use of the cascading scheme, in which electrons sequentially traversing N/sub p/ (typically N/sub p//spl sim/30) stacked active regions emit N/sub p/ laser photons. A near optimum performance was achieved by optimizing the design of the active regions and injectors. Additionally, the waveguide cladding layers were made from InP, the lower cladding being formed by the InP substrate, the upper cladding by InP grown by molecular beam epitaxy (MBE) using solid source phosphorous. This helps to improve in particular the high temperature performance of the lasers. The active region is of the so-called "three well vertical transition" design and consists of three InGaAs quantum wells closely coupled by thin AlInAs barriers.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; laser beams; laser transitions; molecular beam epitaxial growth; optical fabrication; quantum well lasers; ridge waveguides; waveguide lasers; 8 mum; AlInAs; AlInAs barriers; InGaAs; InGaAs quantum wells; InGaAs-AlInAs; InP; InP substrate; active region; active regions; cascading scheme; design; high power quantum cascade lasers; high temperature performance; injectors; laser photons; lower cladding; molecular beam epitaxy; near optimum performance; sequential transversing electrons; stacked active regions; three well vertical transition design; upper cladding; waveguide cladding layers; Design optimization; Electron emission; Indium phosphide; Molecular beam epitaxial growth; Power lasers; Quantum cascade lasers; Solids; Substrates; Temperature; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Laser Conference, 1998. ISLC 1998 NARA. 1998 IEEE 16th International
Conference_Location
Nara, Japan
ISSN
0899-9406
Print_ISBN
0-7803-4223-2
Type
conf
DOI
10.1109/ISLC.1998.734217
Filename
734217
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