Title :
32nm device architecture optimization for critical path speed improvement
Author :
Gwoziecki, R. ; Kohler, S. ; Arnaud, F.
Author_Institution :
STMicroelectron., Crolles
Abstract :
This study investigates key elements improving CMOS critical path speed. We proposed a full analysis of input signal slope impact on the switching current trajectories depending on Vt centering. Based on inverter output characteristics shape, we demonstrated that speed of low-Vt (LVT) path preferred higher drive current (ION) whereas high-Vt (HVT) cells speed is enhanced by lower drain induced barrier lowering (DIBL). Finally, we proposed a link with transistor architecture by optimizing halos and light-doping-drain (LDD) design to improve logic gate as a function of Vt options.
Keywords :
CMOS integrated circuits; optimisation; CMOS critical path speed; input signal slope impact; inverter output characteristic; size 32 nm; switching current trajectories; CMOS logic circuits; Delay; Design optimization; Electronic mail; Inverters; Logic devices; Logic gates; Microelectronics; Shape; Signal analysis;
Conference_Titel :
VLSI Technology, 2008 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-1802-2
Electronic_ISBN :
978-1-4244-1803-9
DOI :
10.1109/VLSIT.2008.4588610