• DocumentCode
    2414835
  • Title

    Reverse Engineering in the Semiconductor Industry

  • Author

    Torrance, Randy ; James, Dick

  • Author_Institution
    Chipworks Inc., Ottawa
  • fYear
    2007
  • fDate
    16-19 Sept. 2007
  • Firstpage
    429
  • Lastpage
    436
  • Abstract
    The intent of this paper is to give an overview of the place of reverse engineering (RE) in the semiconductor industry, and the techniques used to obtain information from semiconductor products. The continuous drive of Moore´s law to increase the integration level of silicon chips has presented major challenges to the reverse engineer, obsolescing simple teardowns and demanding the adopted of new and more sophisticated technology to analyse chips. This trend is continuing; the 2006 update of the International Technology Roadmap for Semiconductors is predicting the shrinkage of transistor gates from the current 65-nm generation to 16 nm at the turn of the decade, and the usage of over 1.5 billion transistors in high-volume microprocessor chips. The paper covers product teardowns, and discusses the techniques used for system-level analysis, both hardware and software; circuit extraction, taking the chip down to the transistor level and working back up through the interconnects to create schematics; and process analysis, looking at how a chip is made, and what it is made of. Examples are also given of each type of RE.
  • Keywords
    microprocessor chips; reverse engineering; semiconductor device manufacture; transistors; Moore law; circuit extraction; microprocessor chips; reverse engineering; semiconductor industry; silicon chips; system-level analysis; transistor gates; Business; Companies; Electronics industry; Integrated circuit interconnections; Licenses; Packaging; Protection; Reverse engineering; Signal analysis; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2007. CICC '07. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-1623-3
  • Electronic_ISBN
    978-1-4244-1623-3
  • Type

    conf

  • DOI
    10.1109/CICC.2007.4405767
  • Filename
    4405767