Title :
Design and fabrication of microfluidic channel using dry film photoresist for air sampling application
Author :
Sun Jianwen ; Liu Zewen ; Yang Kun ; Lu Yanwu
Author_Institution :
Inst. of Microelectron., Tsinghua Univ., Beijing, China
Abstract :
This paper presents a design and microfabrication of microchannels in virtual impactor using multilayer dry film photoresist. 8 layers Riston® RSD200 series dry film photoresist were used in this study to realize microfluidic channel with thickness of 400μm.Virtual impactor with total size of 15×20mm is realized. The lateral feature size of the channel is 100μm. The measurement results show that the channel sidewall angle is 127° invertical, which is good enough for forming the air flow path.
Keywords :
air pollution measurement; microchannel flow; microsensors; photoresists; Riston RSD200 series dry film photoresist; air sampling application; microchannels microfabrication; microfluidic channel; multilayer dry film photoresist; size 100 mum; size 15 mm; size 20 mm; size 400 mum; virtual impactor; Abstracts; Atmospheric measurements; Fabrication; Micromechanical devices; Particle measurements; Real-time systems; Substrates;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
DOI :
10.1109/ICSICT.2014.7021219
