DocumentCode :
2416357
Title :
Process/Product Interactions in a Concurrent Design Environment
Author :
Bair, Larry
Author_Institution :
Adv. Micro Devices Boxborough, Boxborough
fYear :
2007
fDate :
16-19 Sept. 2007
Firstpage :
779
Lastpage :
782
Abstract :
The interactions between VLSI processes and the products built in them continue to perplex those who design and those who manufacture semiconductor chips. Predicting, preventing, and minimizing these interactions is compounded by attempts to minimize time-to-market through concurrent process and design development in integrated design and manufacturing environments. Past experience, engineering conservatism, and flexible design techniques enable successful concurrent deep submicron CMOS VLSI designs.
Keywords :
VLSI; integrated circuit manufacture; VLSI; concurrent design; process-product interaction; semiconductor chip; Circuit simulation; Concurrent engineering; Digital circuits; Feedback; Manufacturing processes; Microprocessors; Process design; Product design; Silicon; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 2007. CICC '07. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-1623-3
Electronic_ISBN :
978-1-4244-1623-3
Type :
conf
DOI :
10.1109/CICC.2007.4405845
Filename :
4405845
Link To Document :
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