DocumentCode :
2416955
Title :
Determination of reliability on MOCVD grown InGaP/GaAs HBT´s under both thermal and current acceleration stresses
Author :
Feng, Kevin T. ; Rushing, Lance ; Canfield, Phil ; Flores, Larry
Author_Institution :
Reliability Dept., Conexant Syst. Inc., Newbury Park, CA, USA
fYear :
2001
fDate :
2001
Firstpage :
159
Lastpage :
180
Abstract :
Conexant´s reliability infrastructure was utilized to determine the reliability of next generation InGaP/GaAs heterojunction bipolar transistors (HBT´s). The investigated InGaP HBT´s were subjected to stresses at three junction temperatures and three current densities, in order to extract both thermal and current acceleration factors. The primary failure mode we identified for all stress conditions is sudden Beta degradation characterized by an increase of base current over time. The thermal activation energy was extracted to be 0.97 eV for Beta degradation. The current acceleration of transistor lifetime is modeled as a power law relationship and we have extracted a square root dependence of lifetime on current density.
Keywords :
III-V semiconductors; MOCVD coatings; failure analysis; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; semiconductor device reliability; InGaP-GaAs; InGaP/GaAs heterojunction bipolar transistor; MOCVD growth; beta degradation; current acceleration stress; current density; device lifetime; failure mode; junction temperature; reliability; thermal acceleration stress; thermal activation energy; Acceleration; Current density; Gallium arsenide; Heterojunction bipolar transistors; Life testing; MOCVD; Packaging; Temperature; Thermal degradation; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
GaAs Reliability Workshop, 2001. Proceedings
Print_ISBN :
0-7908-0066-7
Type :
conf
DOI :
10.1109/GAASRW.2001.995743
Filename :
995743
Link To Document :
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