Title :
Optimization of uniformity in resistive switching memory by reducing thermal effect
Author :
Zhe Chen ; Peng Huang ; Haitong Li ; Bing Chen ; Yi Hou ; Feifei Zhang ; Bin Gao ; Lifeng Liu ; Xiaoyan Liu ; Jinfeng Kang
Author_Institution :
Inst. of Microelectron., Peking Univ., Beijing, China
Abstract :
In this paper, a technical solution to suppress the fluctuation of resistive switching in resistive random access memory (RRAM) is proposed based on the physical understanding. To investigate the impact of thermal effect, we focus on ion migration affected by diffusion/drift forces and Joule heating. The results reveal that the duration of pulse width results in larger variation in LRS distribution due to oxygen ions diffusion assisted by thermal effect, while it has little impact on HRS distribution. Thus shorter pulse width is preferred to achieve better uniformity. The correctness of the proposed method is verified by the measured data.
Keywords :
diffusion; fluctuations; optimisation; resistive RAM; switching circuits; Joule heating; RRAM; diffusion-drift forces; fluctuation suppression; ion migration; oxygen ion diffusion; pulse width duration; reducing thermal effect; resistive random access memory; resistive switching memory; shorter pulse width; uniformity optimization; Abstracts; Hafnium compounds; Ions; Resistance; Switches;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
DOI :
10.1109/ICSICT.2014.7021321