• DocumentCode
    241897
  • Title

    Investigation of charge loss mechanisms IN 3D TANOS cylindrical junction-less charge trapping memory

  • Author

    Xinkai Li ; Zongliang Huo ; Lei Jin ; Yan Wang ; Jing Liu ; Dandan Jiang ; Xiaonan Yang ; Ming Liu

  • Author_Institution
    Inst. of Microelectron., Beijing, China
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    This paper presents a detailed simulation analysis of the charge loss mechanisms in 3D TANOS cylindrical junction-less charge trapping memory devices. For the programmed state, the role of tunneling through the bottom oxide and top oxide in vertical charge loss were compared, and the latter is found to be the dominant component. It is also found that lateral charge migration shows dependence on the shape of charge trapping layer. And the winding charge trapping layer shows favorable lateral migration performance. Simulation results show that lateral charge migration is more severe rather than vertical charge loss and must be focused with decreasing memory cell size. The result will give an guidance for high density 3D memory design optimization.
  • Keywords
    NAND circuits; flash memories; optimisation; 3D TANOS; 3D memory design optimization; bottom oxide; charge loss mechanisms; charge trapping layer; charge trapping memory; cylindrical junctionless CTM; lateral charge migration; lateral migration performance; top oxide; vertical charge loss; Abstracts; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021373
  • Filename
    7021373