• DocumentCode
    2419750
  • Title

    Fabrication of 3-D submicron glass structures by FIB

  • Author

    Chao, C.H. ; Pan, C.T. ; Wu, J.R.

  • Author_Institution
    Dept. of Mech. & Electro-Mech. Eng., National Sun Yat-Sen Univ., Kaoshiung
  • fYear
    2007
  • fDate
    16-19 Jan. 2007
  • Firstpage
    588
  • Lastpage
    592
  • Abstract
    The fabrication characteristic of focused ion beam (FIB) for Pyrex glass was investigated. FIB has several advantages such as high sensitivity, high material removal rates, low forward scattering and direct fabrication in selective area without any etching mask, etc. In this study, FIB etched Pyrex glass was used for fast fabrication of 3D submicron structures. A high aspect-ratio (HAR) glass structure of 5 (1.97mum depth/0.39 mum width) was fabricated. The experimental results in terms of limiting beam size, ion dose (ion/cm2), beam current, etc. was discussed. The influence of XeF2 gas on FIB glass fabrication was investigated.
  • Keywords
    focused ion beam technology; glass; sputter etching; 0.39 micron; 1.97 micron; 3D submicron glass; FIB; Pyrex glass; focused ion beam; high aspect-ratio glass structure; Biological materials; Biomedical optical imaging; Etching; Fabrication; Glass; Ion beams; Optical materials; Optical scattering; Optical sensors; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems, 2007. NEMS '07. 2nd IEEE International Conference on
  • Conference_Location
    Bangkok
  • Print_ISBN
    1-4244-0610-2
  • Type

    conf

  • DOI
    10.1109/NEMS.2007.352088
  • Filename
    4160391
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2419750