• DocumentCode
    242116
  • Title

    On the properties of conducting filament in ReRAM

  • Author

    Xiaojuan Lian ; Lanza, Mario ; Rodriguez, Alex ; Miranda, E. ; Sune, Jordi

  • Author_Institution
    Dept. d´Eng. Electron., Univ. Autonoma de Barcelona, Bellaterra, Spain
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The conducting properties of resistive switching filaments in ReRAM are studied. Departing from first-principle simulations of electron transport along paths of oxygen vacancies in HfO2, the Quantum Point Contact model is reformulated in terms of a bundle of such vacancy paths. By doing this, the number of model parameters is reduced and a much clearer link between the microscopic structure of the conductive filament and its electrical properties can be provided. As an example, a simple geometrical model for the microscopic structure of the CF is proposed and it is used to track the change of the conducting properties during the set/reset transitions. The model has been further checked by measurements at the nanoscale by means of CAFM.
  • Keywords
    conducting materials; hafnium compounds; high-k dielectric thin films; integrated circuit modelling; quantum point contacts; random-access storage; CAFM; HfO2; ReRAM; conducting filament properties; electrical properties; electron transport first-principle simulations; geometrical model; microscopic structure; model parameters; quantum point contact model; resistive switching filaments; set-reset transitions; vacancy paths; Abstracts; Anodes; Atmosphere; Electric breakdown; Electronic mail; Hafnium compounds; Reliability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021484
  • Filename
    7021484