Title :
An investigation of response surfaces among process, device and circuit using analytical model
Author_Institution :
Syst. LSI Design Div., Toshiba Corp., Yokohama, Japan
Abstract :
This article analyzes the process-to-device and device-to-circuit response surfaces using an analytical model to investigate the definition of the worst-case circuit models. It is found that the worst-cases for L, tox and Nchn corresponded to those for the propagation delay τpd of a ring oscillator
Keywords :
integrated circuit modelling; oscillators; semiconductor device models; semiconductor process modelling; analytical model; circuit model; device model; device-circuit response surfaces; process model; process-device response surfaces; propagation delay; response surfaces; ring oscillator; worst-case circuit models; Analytical models; Circuits; Economic indicators; Fluctuations; Large scale integration; Probability distribution; Propagation delay; Response surface methodology; Ring oscillators; Tail;
Conference_Titel :
Statistical Metrology, 2000 5th International Workshop on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5896-1
DOI :
10.1109/IWSTM.2000.869300
