The Preparation of Self-formed PDMS Nanostructures by RIE Etching

In this study, a novel fabrication method of nanostructure by reactive ion etching (RIE) process on PDMS without predefinition of nanopattern is proposed. During etching process, self-formed high-aspect-ratio nanostructure was observed on PDMS surface adjacent to SiO₂ area, suggested the provision of nano masks from the SiO₂ residue during RIE etching. In tuning the flow rate of working gases (CF₄, O₂), the distribution of nanostructure can be controlled. Furthermore, it was observed that different species of nanostructures could be fabricated by the selection of mask materials (SiO₂, Cu) under RIE etching.