• DocumentCode
    242171
  • Title

    Failure analysis and elimination method of pitting problem on microchip Al bond pads in wafer fabrication

  • Author

    Jingwei Peng ; Po Li ; Guoguang Rong ; Xinrui Xu

  • Author_Institution
    Sch. of Microelectron., Shanghai Jiao Tong Univ., Shanghai, China
  • fYear
    2014
  • fDate
    28-31 Oct. 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Bond pad reliability is very important for either copper or aluminum back-end process. Pits on bond pad causes bonding sticking issue, brings reliability failure and the mechanism has been studied by [1][2], however no solution to solve this problem totally was provided in those two works. In this article, we designed a series of experiments including bond pad deposition, pad etch, strip and wet tank to study pits mechanism and methods of removing them on bond pad. The results, analysis and the limitation of implementation for different approach are discussed for every experiment; and a novel solution by DI wafer sequence which can solve pits problem was reported for the first time.
  • Keywords
    aluminium; etching; failure analysis; integrated circuit reliability; plasma deposition; wafer bonding; Al; DI wafer sequence; back-end process; bond pad deposition; bond pad reliability; bonding sticking issue; copper; failure analysis; microchip aluminum bond pad; pad etch; pitting problem elimination method; reliability failure; wafer fabrication; wet tank; Corrosion; Fabrication; Films; Metals; Plasmas; Solvents; Strips;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
  • Conference_Location
    Guilin
  • Print_ISBN
    978-1-4799-3296-2
  • Type

    conf

  • DOI
    10.1109/ICSICT.2014.7021511
  • Filename
    7021511