DocumentCode
2422069
Title
Analysis of impedance matching control
Author
Hirose, Yuuki ; Kawamura, Atsuo ; Takayanagi, Atsushi ; Takada, Hirokazu
Author_Institution
Div. of Electr. & Comput. Eng., Yokohama Nat. Univ., Yokohama, Japan
fYear
2009
fDate
17-20 May 2009
Firstpage
1188
Lastpage
1191
Abstract
This paper is concerning a new impedance matching control used in the plasma processing. RF electricity is supplied to the plasma chamber and stability operation is required. For this purpose the impedance of the equivalent loads is controlled to be 50 Omega. Therefore the capacitance of capacitors in an LC circuit called a matching box is adjusted and the receiving end impedance is maintained to be 50 Omega. In this paper a novel control method of an impedance matching is proposed and the successful experimental results are presented.
Keywords
impedance matching; plasma applications; power supplies to apparatus; LC circuit; impedance matching; impedance matching control; plasma chamber; plasma processing; radio frequency electricity; resistance 50 ohm; Capacitance; Capacitors; Circuit stability; Computer aided manufacturing; Impedance matching; Plasma displays; Plasma materials processing; Plasma stability; Radio control; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Electronics and Motion Control Conference, 2009. IPEMC '09. IEEE 6th International
Conference_Location
Wuhan
Print_ISBN
978-1-4244-3556-2
Electronic_ISBN
978-1-4244-3557-9
Type
conf
DOI
10.1109/IPEMC.2009.5157563
Filename
5157563
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