A new program at RIT: master of engineering in microelectronics manufacturing engineering

Author

Fuller, L.F. ; Hesler, K.H. ; Kurinec, S.K. ; Lane, R.L. ; Pearson, R.E. ; Smith, B.W. ; Turkman, I.R.

Author_Institution

Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA

fYear

1989

fDate

12-14 Jun 1989

Firstpage

108

Lastpage

111

Abstract

Rochester Institute of Technology, College of Engineering, has established a new master of engineering degree program in microelectronics manufacturing engineering. The program is one year (four quarters) in duration and is designed for BS graduates in engineering or science. The core courses are Microelectronics I, II, III, Microlithography I, II, and Manufacturing Science I, II. Concentration courses may be selected from a list of courses including computer integrated manufacturing, statistical design of experiments, facilities design, safety, and others. The core courses are discussed, and the facilities are described

Keywords

educational courses; semiconductor device manufacture; Manufacturing Science; Microlithography; RIT; Rochester Institute of Technology; computer integrated manufacturing; core courses; facilities design; microelectronics manufacturing engineering; safety; statistical design; Chemistry; Educational institutions; Electronics industry; Fabrication; Maintenance engineering; Manufacturing; Microelectronics; Optical imaging; Optical scattering; Semiconductor device manufacture;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1989. Proceedings., Eighth

Conference_Location

Westborough, MA

ISSN

0749-6877

Type

conf

DOI

10.1109/UGIM.1989.37315

Filename

37315