Title :
Common zeros in synchronization of high-precision stage systems
Author :
Navarrete, Miguel Ochoa ; Heertjes, Marcel F. ; Munnig Schmidt, Robert H.
Author_Institution :
Precision & Microsyst. Eng., Delft Univ. of Technol., Delft, Netherlands
Abstract :
In synchronization of high-precision motion systems, in particular the synchronization between a wafer stage system and a reticle stage system of a wafer scanner, a novel feedforward structure is studied. In this structure, the numerator of each plant model is described by an input shaping filter capturing the zeros of said model. The denominator is described by a feedforward filter capturing the poles. Ideally, this gives zero error tracking of both the reticle and wafer stage systems without the need for plant inversion. But in view of the different input shaping filter operations, appropriate synchronization behavior is not guaranteed. To obtain both appropriate tracking and synchronization behavior, we propose to augment the reticle stage filters with the zeros from the wafer stage plant model. Reversely, the wafer stage filters are augmented with the zeros from the reticle stage plant model. The feasibility of such an approach is confirmed by simulation results and, to some extend, by measurement results obtained from an industrial wafer scanner.
Keywords :
poles and zeros; production equipment; reticles; semiconductor industry; semiconductor technology; synchronisation; feedforward filter; feedforward structure; high-precision motion systems; high-precision stage systems; industrial wafer scanner; input shaping filter operations; plant model numerator; poles; reticle stage filters; reticle stage plant model; reticle stage system; tracking-synchronization behavior; wafer stage plant model; wafer stage system; zero error tracking; Cost function; Feedforward neural networks; Finite impulse response filters; Poles and zeros; Semiconductor device modeling; Synchronization;
Conference_Titel :
Mechatronics (ICM), 2015 IEEE International Conference on
Conference_Location :
Nagoya
DOI :
10.1109/ICMECH.2015.7084045