Title :
Extracting the Young´s Modulus and Stress Gradient of Thin Films from the Pull-in Voltage of a Micro Curled Cantilever Beam
Author :
Hu, Yuh-Chung ; Wei, Chung-Sheng ; Hsiao, Chun-Ching ; Lin, David T W
Author_Institution :
Mechatronic Eng., Huafan Univ.
Abstract :
This paper presents a high-precision algorithm for extracting the Young´s modulus and stress gradient of thin films from the pull-in voltage measurement of a micro curled cantilever beam made of thin film materials. The algorithm considers the important issues including the fringing fields, the electromechanical coupling, and the stress-induced initial curling of the micro structures. The deviation of the extracted Young´s modulus and stress gradient from the reality are below 4%. The present algorithm is very applicable to the wafer-lever testing of MEMS devices since the driving and response signals are both electric, the present algorithm could be accomplished using existing semiconductor testing equipments through probing on the bonding pads of devices.
Keywords :
Young´s modulus; beams (structures); cantilevers; electromechanical effects; internal stresses; micromechanical devices; thin films; voltage measurement; MEMS devices; Young´s modulus; electromechanical coupling; micro curled cantilever beam; pull-in voltage measurement; semiconductor testing equipments; stress gradient; stress-induced initial curling; thin film materials; wafer-lever testing; Capacitance; Electrostatics; Integrated circuit testing; Materials testing; Micromechanical devices; Residual stresses; Semiconductor device testing; Structural beams; Transistors; Voltage measurement; Electrostatic; Fringing Field; MEMS; Pull-in Voltage; Residual Stress; Young´s modulus;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems, 2007. NEMS '07. 2nd IEEE International Conference on
Conference_Location :
Bangkok
Print_ISBN :
1-4244-0610-2
DOI :
10.1109/NEMS.2007.352026