Title :
Technological Scaling and Minimization of 1/fNoise in SiGe HBTs Coupled Mode N-Push Oscillators/VCOs
Author :
Rohde, Ulrich L. ; Poddar, Ajay K.
Author_Institution :
Synergy Microwave Corp., Paterson, NJ
Abstract :
This paper investigates the impact of technological scaling and minimization of flicker (1/f) noise on SiGe HBTs in coupled mode N-push oscillator/VCO configuration, which have recently emerged as a strong contender for RF and mixed-signal applications. 1/f noise in SiGe HBTs is sensitive with technological scaling and upconverted in coupled mode oscillators due to the presence of asymmetrical output from their subsequent N oscillator subcircuits that forms N-push configuration. Improving the symmetry of the coupled mode N-push topology develops a method of minimizing the 1/f noise up-conversion and phase noise in the scaled device. The experimental result shows 10-15 dB improvement in the noise performances for symmetrical coupled mode VCO @ 10 kHz offset from the carrier frequency 8000 MHz in comparison to the asymmetrical version of the coupled mode scaled device (Infineon BFP 620)
Keywords :
1/f noise; flicker noise; heterojunction bipolar transistors; network topology; phase noise; silicon compounds; voltage-controlled oscillators; 1/f noise; 10 kHz; 8000 MHz; Infineon BFP 620; N-push topology; SiGe; SiGe HBT; VCO; coupled mode N-push oscillators; flicker noise minimization; phase noise; technological scaling; 1f noise; CMOS technology; Cutoff frequency; Germanium silicon alloys; Low-frequency noise; Phase noise; Radio frequency; Semiconductor device noise; Silicon germanium; Voltage-controlled oscillators; 1/fNoise; N-Push; SiGe HBTs; VCO;
Conference_Titel :
Radio and Wireless Symposium, 2007 IEEE
Conference_Location :
Long Beach, CA
Print_ISBN :
1-4244-0444-4
Electronic_ISBN :
1-4244-0445-2
DOI :
10.1109/RWS.2007.351754