Title :
Impact of stress time of program operation on the endurance performance
Author :
Guoming Wang ; Baohe Yang ; Meiyun Zhang ; Shibing Long ; Ming Liu
Author_Institution :
Tianjin Key Lab. of Film Electron. & Commun. Devices, Tianjin Univ. of Technol., Tianjin, China
Abstract :
In this paper, for the first time, we have studied the effect of various pulse program conditions on the endurance performance of resistive random access memory (RRAM), based on a novel pulse measurement method. When the width of program or SET pulse increases while the pulse height remains constant, the resistance of the low resistance state (LRS) decreases first and then increases. Similarly, when a measurement is carried out by a DC sweeping method, an identical trend can be found. Under different DC program conditions, as the compliance current is reached, the current that flows through the device always maintains at the value of the compliance current, and the stress time is just controlled by changing stop voltage (Vstop) in DC sweeping. By revealing the relationship between the LRS resistance and the stress time of pulse or DC operation, we found that the endurance performance of the bipolar valence change mechanism (VCM) device can be improved by selecting the appropriate pulse width.
Keywords :
pulse measurement; resistive RAM; DC program conditions; DC sweeping method; LRS resistance; RRAM; SET pulse; VCM device; bipolar valence change mechanism device; compliance current; endurance performance; low resistance state; pulse measurement method; pulse program conditions; resistive random access memory; stress time; Abstracts; Market research; Switches; Voltage measurement;
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
DOI :
10.1109/ICSICT.2014.7021620