DocumentCode :
242461
Title :
Influence of the thermal oxidation on minority carrier lifetime of 6H-SiC
Author :
Ting Zhou ; Yu-Ming Zhang ; Lei Yuan ; Qing-Wen Song ; Xiao-Yan Tang
Author_Institution :
Key Lab. of Wide Band Gap Semicond. Mater. & Devices, Xidian Univ., Xi´an, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
The minority carrier lifetime is one of the most important characteristic parameters of semiconductor materials and devices, which must be put into consideration in improving the on-state characteristics and switch characteristics of high-voltage SiC bipolar power devices. The minority carrier lifetime of 6H-SiC samples through different thermal oxidation process is measured by microwave photoconductive decay (μ-PCD) method. The experiment results show that the higher the temperature, the more obviously the carrier lifetime improves under the same oxidation time; the longer oxidation time, the longer minority carrier lifetime will be obtained under the same oxidation temperature. An influence analysis of thermal oxidation on minority carrier lifetime is also given.
Keywords :
carrier lifetime; hydrogen; oxidation; photoconductivity; silicon compounds; wide band gap semiconductors; H-SiC; high-voltage bipolar power devices; microwave photoconductive decay method; minority carrier lifetime; on-state characteristics; oxidation temperature; switch characteristics; thermal oxidation; Abstracts; Conductivity; Materials; Modulation; Oxidation; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021655
Filename :
7021655
Link To Document :
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