DocumentCode :
242490
Title :
Study on the conduction mechanism of surface leakage current for AlGaN/GaN HEMTS under reverse gate bias
Author :
Xuefeng Zheng ; Shuang Fan ; Di Kang ; Weiwei Sun ; Xiaohua Ma ; Yue Hao
Author_Institution :
Sch. of Microelectron., Xidian Univ., Xi´an, China
fYear :
2014
fDate :
28-31 Oct. 2014
Firstpage :
1
Lastpage :
3
Abstract :
This paper focuses on the conduction mechanism of surface leakage for AlGaN/GaN HEMTs with SiN passivation. By utilizing the dual-gate structure, the surface leakage current can be exactly extracted. The surface leakage currents at different temperatures under the reverse gate bias have been measured accordingly. Base on the theoretical analysis of two-dimensional variable range hopping mechanism, it is observed that the experimental data have a good agreement with this mechanism. Therefore, it is concluded that the surface leakage current is induced by the electron hopping through the surface states around the Fermi level in AlGaN layer. Eventually, the activation energy of surface leakage has been extracted, which is around 0.083 eV.
Keywords :
Fermi level; III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; leakage currents; silicon compounds; wide band gap semiconductors; AlGaN-GaN; Fermi level; HEMT; SiN; activation energy; conduction mechanism; dual-gate structure; electron hopping; high-electron mobility transistors; reverse gate bias; surface leakage current; surface states; two-dimensional variable range hopping mechanism; Abstracts; Aluminum gallium nitride; Gallium nitride; Leakage currents; Logic gates; Ohmic contacts; Radio access networks;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2014 12th IEEE International Conference on
Conference_Location :
Guilin
Print_ISBN :
978-1-4799-3296-2
Type :
conf
DOI :
10.1109/ICSICT.2014.7021669
Filename :
7021669
Link To Document :
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