DocumentCode
2425227
Title
A process design model and an application
Author
Kalyanaram, Gurumurthy
Author_Institution
Texas Univ., Dallas, TX, USA
fYear
1997
fDate
27-31 Jul 1997
Firstpage
956
Abstract
Summary form only given. There are two methodologies, conjoint analysis and the Taguchi design model, that provide the tools for product and process design. Here, the author briefly describes the application of the Taguchi model to the capillary drawing process in a semiconductor firm. A well designed capillary drawing process is shown to be critical to managing the yield in semiconductor manufacture
Keywords
capillarity; circuit optimisation; design engineering; drawing (mechanical); integrated circuit yield; management; manufacturing processes; semiconductor device manufacture; Taguchi design model; capillary drawing process; process design model; semiconductor manufacturing firm; yield management; Calibration; Costs; Fractionation; Manufacturing processes; Process control; Process design; Product design; Product development; Signal to noise ratio; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Innovation in Technology Management - The Key to Global Leadership. PICMET '97: Portland International Conference on Management and Technology
Conference_Location
Portland, OR
Print_ISBN
0-7803-3574-0
Type
conf
DOI
10.1109/PICMET.1997.653735
Filename
653735
Link To Document