Electrodeposition of CoNiMnP-based permanent magnetic film

This paper presents the fabrication process and the properties of the CoNiMnP-based permanent magnetic film fabricated with electrodeposition technique. The CoNiMnP magnetic film was fabricated on silicon substrate using MEMS compatible micromachining process. The film consists of magnet array with 5mm×5mm square cells with the thickness of 12μm and 20μm. And some specific methods were used in the deposition process to improve the magnetic properties of the magnetic film, such as 5000Gs external magnetic fields provided by two magnets as well as the pulse current with density of 8mA/cm². The results showed that the characterization of CoNiMnP-based permanent magnetic film was improved. For 20μm electroplated magnetic film, the coercivity of vertical plane is 1200Oe with the retentivity is 0.12Teslas, and the energy density is 3.24kJ/m³. This permanent magnetic film has high vertical anisotropy and high energy density and it can be used for realizing magnetic MEMS device.