DocumentCode
2425558
Title
Thermal-uniformity-aware X-filling to reduce temperature-induced delay variation for accurate at-speed testing
Author
Yoneda, Tomokazu ; Inoue, Michiko ; Sato, Yasuo ; Fujiwara, Hideo
Author_Institution
Nara Inst. of Sci. & Technol., Kansai Science City, Japan
fYear
2010
fDate
19-22 April 2010
Firstpage
188
Lastpage
193
Abstract
It is well known that the test mode exceeds the functional mode in power consumption, which is not uniformly distributed within the circuit. The non-uniformity in spatial power distribution may cause localized heating and temperature differences within the circuit. Since gate delay depends on junction temperature, thermal differences within the circuit may lead to erroneous pass or fail in at-speed testing. This paper first discusses the importance of spatial thermal uniformity for high quality and accurate at-speed testing. The paper also presents an X-filling technique that minimizes the spatial temperature variation within the circuit while preserving the overall circuit power consumption at low level. Experimental results show the effectiveness of the proposed method compared to the existing X-filling techniques.
Keywords
VLSI; heating; integrated circuit testing; VLSI test; at-speed testing accuracy; circuit power consumption; gate delay; junction temperature; localized heating; spatial power distribution; spatial temperature variation; spatial thermal uniformity; temperature-induced variation; thermal-uniformity-aware X-filling; Delay; Testing; Very large scale integration; X-filling; at-speed test; test power; thermal-uniformity;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Test Symposium (VTS), 2010 28th
Conference_Location
Santa Cruz, CA
ISSN
1093-0167
Print_ISBN
978-1-4244-6649-8
Type
conf
DOI
10.1109/VTS.2010.5469578
Filename
5469578
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