Title :
Fabrication of microlens array based on multiple plane waves interference
Author :
Li, Gaoming ; Liu, Shou ; Liu, Gouhua ; Qiu, Yishen ; Chen, Xiaoyun
Author_Institution :
Sch. of Phys. & Mech. & Electr. Eng., Xiamen Univ., Xiamen, China
Abstract :
A fabrication process of microlens array using multiple plane waves interference is described. Maskless exposure system is superposed on a photoresist coated substrate layer. Multiple plane waves interference is provided by the refractions of gratings. The period of microlens array range from 1um to 10um and the diameter of single microlen can be produced less than the period. Furthermore large area of micro arrays can be realized with low cost.
Keywords :
holography; microlenses; photoresists; maskless exposure system; microlens array; multiple plane waves interference; photoresist coated substrate layer; Holographic optical components; Interference; Microlenses;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4244-6543-9
DOI :
10.1109/NEMS.2010.5592208
