DocumentCode
2427505
Title
Application of CW-CRDS to monitor and control chemical vapor deposition
Author
Green, D.S. ; Looney, J.P. ; Rubloff, G.W.
fYear
2000
fDate
24-28 July 2000
Abstract
Continuous wave excitation cavity ring-down spectroscopy (CW-CRDS) is being developed for real time chemical sensing of volatile CVD byproducts (e.g. HF, H/sub 2/O) and as a quantitative and robust metrology tool for advanced process control methodologies.
Keywords
chemical vapour deposition; gas sensors; infrared spectroscopy; optical sensors; process control; process monitoring; spectrochemical analysis; CVD control; CVD monitoring; CW excitation cavity ring-down spectroscopy; advanced process control methodologies; benchtop sensing platform; quantitative metrology; real time chemical sensing; volatile CVD byproducts; wafer state metrology; Absorption; Chemical vapor deposition; Hafnium; Metrology; Mirrors; Monitoring; Process control; Semiconductor device manufacture; Semiconductor films; Spectroscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic-Enhanced Optics, Optical Sensing in Semiconductor Manufacturing, Electro-Optics in Space, Broadband Optical Networks, 2000. Digest of the LEOS Summer Topical Meetings
Conference_Location
Aventura, FL, USA
ISSN
1099-4742
Print_ISBN
0-7803-6252-7
Type
conf
DOI
10.1109/LEOSST.2000.869712
Filename
869712
Link To Document