Title :
Scatterometry applied to microelectronics processing
Author_Institution :
Center for High Technol. Mater., New Mexico Univ., Albuquerque, NM, USA
Abstract :
This past decade has seen the development of a non-imaging optical dimensional metrology technique known as scatterometry. Scatterometry is a nondestructive optical technique that records and analyzes changes in the intensity of light reflected from a periodic scattering surface. By measuring and analyzing the light diffracted from a patterned periodic sample, the dimensions of the sample itself can be measured. Scatterometry exploits the sensitivity of diffraction from a sample to changes in the line-shape of the sample. The use of an elementary sample illumination system, combined with a rigorous scattered signal analysis procedure presents a significant advantage over conventional metrology techniques. These are discussed in detail in this paper.
Keywords :
Integrated circuit measurement; Light scattering; Measurement by laser beam; Photolithography; Process monitoring; Size measurement; diffraction sensitivity; elementary sample illumination system; light intensity changes; line-shape changes; measurement precision; measurement repeatability; metal layers; microelectronics processing; nondestructive optical technique; optical dimensional metrology; patterned periodic sample; periodic scattering surface; scattered signal analysis procedure; scatterometry; Light scattering; Lighting; Metrology; Microelectronics; Optical diffraction; Optical recording; Optical scattering; Optical sensors; Pattern analysis; Radar measurements;
Conference_Titel :
Electronic-Enhanced Optics, Optical Sensing in Semiconductor Manufacturing, Electro-Optics in Space, Broadband Optical Networks, 2000. Digest of the LEOS Summer Topical Meetings
Conference_Location :
Aventura, FL, USA
Print_ISBN :
0-7803-6252-7
DOI :
10.1109/LEOSST.2000.869722