Title :
Dynamic modelling analysis for control of CVD
Author :
Gevelber, M.A. ; Bufano, M. ; Toledo-Quinones, M. ; Brown, D. ; Passaro, R.
Author_Institution :
Dept. of Manuf. Eng., Boston Univ., MA, USA
fDate :
29 June-1 July 1994
Abstract :
A nonlinear dynamic model of the chemical vapor deposition (CVD) process has been developed and analyzed to obtain insight into the design of an appropriate control structure.
Keywords :
chemical vapour deposition; nonlinear control systems; process control; CVD; chemical vapor deposition; dynamic modelling analysis; nonlinear dynamic model; Chemical analysis; Coatings; Equations; Inductors; Manufacturing processes; Nitrogen; Pressure control; Temperature; Virtual manufacturing; Weight control;
Conference_Titel :
American Control Conference, 1994
Print_ISBN :
0-7803-1783-1
DOI :
10.1109/ACC.1994.735034
