DocumentCode :
2429026
Title :
4-kV 100-Mbps monolithic isolator on SOI with multi-trench isolation for wideband network
Author :
Hashimoto, T. ; Yuyama, Y. ; Amishiro, M. ; Nemoto, M. ; Yukutake, S. ; Kojima, Y. ; Kanekawa, N. ; Takeuchi, Y. ; Watanebe, A.
Author_Institution :
Hitachi Res. Lab., Hitachi Ltd., Hitachi, Japan
fYear :
2009
fDate :
14-18 June 2009
Firstpage :
49
Lastpage :
52
Abstract :
We have developed a monolithic isolator that provides an isolation voltage of 4 kV and a signal transmission rate of 100 Mbps. Two circuit areas are isolated using 34 trenches on a bonded SOI with 3-mum-thick buried oxide. The inequality in the voltages applied to the trenches is reduced using polysilicon resistors parallel to the trenches, which increases the isolation voltage from 2.4 to 4.0 kV. The isolator consists of two series of high-voltage capacitors in which silicon on buried oxide and a third metal are used as electrodes. We have also developed a network interface LSI with 4-channel isolators, which provide 4-kV isolation and 100-Mbps transmission.
Keywords :
broadband networks; isolation technology; silicon-on-insulator; monolithic isolator; multiple trench isolation; polysilicon resistors; silicon on insulator; voltage 2.4 kV to 4 kV; wideband network; Bonding; Capacitors; Circuits; Electrodes; Isolators; Network interfaces; Resistors; Silicon; Voltage; Wideband;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
Conference_Location :
Barcelona
ISSN :
1943-653X
Print_ISBN :
978-1-4244-3525-8
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2009.5157998
Filename :
5157998
Link To Document :
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