DocumentCode :
2429379
Title :
Optimisation of 100V high side LDMOS using multiple simulation techniques
Author :
Elwin, M. ; Holland, P. ; Anteney, I. ; Ellis, J. ; Armstrong, L. ; Birchby, G. ; Igic, P.
Author_Institution :
Dept. of Sch. of Eng., Swansea Univ., Swansea, UK
fYear :
2009
fDate :
14-18 June 2009
Firstpage :
104
Lastpage :
107
Abstract :
A combination of conventional cross sectional process and device simulations combined with top down and 3D device simulations have been used to design and optimise the integration of a 100 V Lateral DMOS (LDMOS) device for high side bridge applications. This combined simulation approach can streamline the device design process and gain important information about end effects which are lost from 2D cross sectional simulations. Design solutions to negate detrimental end effects are proposed and optimised by top down and 3D simulations and subsequently proven on tested silicon.
Keywords :
MOS integrated circuits; optimisation; 3D device simulations; cross sectional process; lateral DMOS device; side bridge applications; silicon; voltage 100 V; Breakdown voltage; CMOS technology; Design optimization; Electrostatics; Integrated circuit manufacture; Manufacturing processes; Power integrated circuits; Power transistors; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's, 2009. ISPSD 2009. 21st International Symposium on
Conference_Location :
Barcelona
ISSN :
1943-653X
Print_ISBN :
978-1-4244-3525-8
Electronic_ISBN :
1943-653X
Type :
conf
DOI :
10.1109/ISPSD.2009.5158012
Filename :
5158012
Link To Document :
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