DocumentCode :
2429451
Title :
Influence of glow cathode on parameters of ion-beam plasma
Author :
Dudin, S.V. ; Zykov, A.V. ; Farenik, V.I.
Author_Institution :
Sci. Center of Phys. Technol., Kharkov State Univ., Ukraine
fYear :
1995
fDate :
5-8 June 1995
Firstpage :
286
Abstract :
Summary form only given. The results of an experimental investigation of ion-beam plasma parameters in an ion etching technological system are presented for the case of ion beam space charge neutralization by a glow cathode-neutralizer (CN) in comparison with analogous results without CN. The measured parameters were plasma potential /spl phi//sub pl/, neutralizing electrons energy distribution f/sub e/ and temperature of its maxwellian kernel T/sub e/. The investigation was performed on the vacuum unit equipped with the multichannel Hall-type ion source "Radical-M" (production of "Vacuummashpribor", Moscow). The beam radius and length was 50 mm and 200 mm respectively, average beam energy was 0.3-1 keV, beam current varied over the range of 1-50 mA. The beam propagated in a vacuum chamber with grounded metal walls at gas pressure in the range of 10/sup -5/-10/sup -3/ Torr. CN was a tungsten wire of 0.4 mm diameter. To measure /spl phi//sub pl/, T/sub e/, f/sub e/ a Langmuir probe was used with addition of modulation technique of probe current double differentiation.
Keywords :
Langmuir probes; glow discharges; ion beams; plasma diagnostics; plasma temperature; plasma-beam interactions; sputter etching; temperature; 0.3 to 1 keV; 1 to 50 mA; 1E-5 to 1E-3 torr; Langmuir probe; W wire; glow cathode; glow cathode-neutralizer; ion beam space charge neutralization; ion etching technological system; ion-beam plasma; maxwellian kernel; multichannel Hall-type ion source Radical-M; neutralizing electrons energy distribution; plasma potential; temperature; vacuum unit; Cathodes; Current measurement; Etching; Ion beams; Plasma applications; Plasma measurements; Plasma temperature; Probes; Space charge; Space technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-2669-5
Type :
conf
DOI :
10.1109/PLASMA.1995.533536
Filename :
533536
Link To Document :
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