Title :
Comparative assessment study of aboveground soft X-ray technology
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
Summary form only given, as follows. The soft X-ray regime accessible at our laboratory nominally extends from photon energies of 10 eV to 10 keV. The technology relies on capacitor-based, short-pulse energy storage devices to generate a high-energy-density plasma 1 cc in volume and lasting about 10 ns. The hot plasma is created either by conversion of short-pulse electrical energy into light ions that heat the plasma or into a magnetically-driven imploding plasma. Applications of these intense soft X-rays include evaluation of their interaction with materials, as an energy source for weapons effects, as a source for ICF experiments, and as a source for weapons physics experiments. Because of management\´s interest in encouraging the development of new applications to this technology, we did a year-long comparative assessment study that involved surveying scientists engaged in such research. The literature is filled with examples of "benchmarking" in the manufacturing and service industries; however, we found only one documented case where scientific research had been benchmarked. Our experience in benchmarking an area of scientific research and some of our findings are described in the paper.
Keywords :
X-ray production; X-rays; explosions; plasma heating; plasma production; 10 eV to 10 keV; ICF experiments; capacitor-based short-pulse energy storage devices; comparative assessment study; energy source; heating; high-energy-density plasma; hot plasma; light ions; magnetically-driven imploding plasma; manufacturing industries; scientific research; service industries; short-pulse electrical energy; soft X-ray regime; soft X-ray technology; weapons effects; weapons physics experiments; Energy storage; Laboratories; Magnetic materials; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Plasma x-ray sources; Resistance heating; Weapons;
Conference_Titel :
Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
Conference_Location :
Madison, WI, USA
Print_ISBN :
0-7803-2669-5
DOI :
10.1109/PLASMA.1995.533542