• DocumentCode
    2430319
  • Title

    Comparative assessment study of aboveground soft X-ray technology

  • Author

    Sweeney, M.A.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • fYear
    1995
  • fDate
    5-8 June 1995
  • Firstpage
    288
  • Abstract
    Summary form only given, as follows. The soft X-ray regime accessible at our laboratory nominally extends from photon energies of 10 eV to 10 keV. The technology relies on capacitor-based, short-pulse energy storage devices to generate a high-energy-density plasma 1 cc in volume and lasting about 10 ns. The hot plasma is created either by conversion of short-pulse electrical energy into light ions that heat the plasma or into a magnetically-driven imploding plasma. Applications of these intense soft X-rays include evaluation of their interaction with materials, as an energy source for weapons effects, as a source for ICF experiments, and as a source for weapons physics experiments. Because of management\´s interest in encouraging the development of new applications to this technology, we did a year-long comparative assessment study that involved surveying scientists engaged in such research. The literature is filled with examples of "benchmarking" in the manufacturing and service industries; however, we found only one documented case where scientific research had been benchmarked. Our experience in benchmarking an area of scientific research and some of our findings are described in the paper.
  • Keywords
    X-ray production; X-rays; explosions; plasma heating; plasma production; 10 eV to 10 keV; ICF experiments; capacitor-based short-pulse energy storage devices; comparative assessment study; energy source; heating; high-energy-density plasma; hot plasma; light ions; magnetically-driven imploding plasma; manufacturing industries; scientific research; service industries; short-pulse electrical energy; soft X-ray regime; soft X-ray technology; weapons effects; weapons physics experiments; Energy storage; Laboratories; Magnetic materials; Plasma applications; Plasma devices; Plasma materials processing; Plasma sources; Plasma x-ray sources; Resistance heating; Weapons;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1995. IEEE Conference Record - Abstracts., 1995 IEEE International Conference on
  • Conference_Location
    Madison, WI, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-2669-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1995.533542
  • Filename
    533542