Title :
Experimental comparison of model-based and conventional pressure control for a plasma reactor
Author :
Subawalla, Hoshang ; Rhinehart, R. Russell
Author_Institution :
Dept. of Chem. Eng., Texas Tech. Univ., Lubbock, TX, USA
fDate :
29 June-1 July 1994
Abstract :
Pressure control in a plasma reactor system is used to experimentally compare nonlinear process-model-based-control, internal model control and conventional proportional-integral (PI) control. The experimental system consists of a single slice plasma etch reactor with an attached radio frequency generator and a vacuum pump. The RF discharge forms the plasma. The control system includes an one inch stepping motor powered butterfly type exhaust valve.
Keywords :
chemical industry; nonlinear control systems; plasma devices; pressure control; process control; PI control; RF discharge; RF generator; butterfly type exhaust valve; chemical process industry; internal model control; nonlinear process-model-based-control; plasma reactor system; pressure control; single slice plasma etch reactor; vacuum pump; Etching; Inductors; Nonlinear control systems; Pi control; Plasma applications; Power system modeling; Pressure control; Process control; Proportional control; Radio frequency;
Conference_Titel :
American Control Conference, 1994
Print_ISBN :
0-7803-1783-1
DOI :
10.1109/ACC.1994.735146
