Title :
Interference photothermal lithography for creation of nanometer elements arrays
Author :
Dryakhlushin, V.F. ; Vostokov, N.V. ; Kilmov, A.Yu.
Author_Institution :
Inst. for Phys. of Microstruct., Acad. of Sci., Nizhny Novgorod, Russia
Abstract :
The conditions for using of two-layer polymer-metal coatings as resists for interference photothermal lithography, are determined. A resist is exposed to several coherent beams of a XeCl laser radiation. This method was used to create arrays of various periodic nanometer structures on a semiconductor surface.
Keywords :
arrays; laser materials processing; light interference; nanotechnology; periodic structures; photolithography; photoresists; polymer films; semiconductor technology; XeCl; XeCl laser radiation; interference photothermal lithography; nanometer element array formation; periodic nanometer structures; resists; semiconductor surface; two-layer polymer-metal coatings; Coatings; Etching; Interference; Laser beams; Lithography; Periodic structures; Physics; Resists; Semiconductor laser arrays; Silicon;
Conference_Titel :
Microwave Conference, 2000. Microwave and Telecommunication Technology. 2000 10th International Crimean
Conference_Location :
Crimea, Ukraine
Print_ISBN :
966-572-048-1
DOI :
10.1109/CRMICO.2000.1255847
