DocumentCode :
2430996
Title :
The future of electrical I/O for microprocessors
Author :
Mahony, Frank O. ; Balamurugan, Ganesh ; Jaussi, James E. ; Kennedy, Joseph ; Mansuri, Mozhgan ; Shekhar, Sudip ; Casper, Bryan
Author_Institution :
Circuit Res. Lab., Intel, Hillsboro, OR, USA
fYear :
2009
fDate :
28-30 April 2009
Firstpage :
31
Lastpage :
34
Abstract :
High-speed CMOS microprocessor I/O has scaled aggressively over the past decade in terms of power and performance largely due to advances in equalization and clocking techniques. With future multi-core processors expected to require >1TB/s bandwidth and dramatically improved power efficiency, there has been some question as to whether electrical I/O will continue to satisfy chip-to-chip communication requirements over the next decade. In this paper, we show that electrical signaling has the power, performance, and density scaling potential to enable the next several generations of systems and applications. Circuit innovation is aggressively pushing link power efficiency toward 1-2mW/Gb/s while departures from legacy channels to include new topologies and materials can significantly improve the power/performance/density tradeoff. Statistical link-level design tools that allow designers to rapidly quantify high-level architecture tradeoffs will enable balanced link designs that co-optimize power, performance, and channel topology.
Keywords :
CMOS digital integrated circuits; clocks; equalisers; integrated circuit design; microprocessor chips; The chip-to-chip communication; balanced link designs; clocking; clocking techniques; electrical I/O; electrical signaling; equalization; high-level architecture; high-speed CMOS microprocessor; link power efficiency; multi-core processors; statistical link-level design tools; Aggregates; Bandwidth; Circuit topology; Clocks; Computer architecture; Microprocessors; Multicore processing; Power generation; Technological innovation; Transceivers; I/O; data link; electrical; low-power; microprocessor; scaling; signaling; transceiver; wireline;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Design, Automation and Test, 2009. VLSI-DAT '09. International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4244-2781-9
Electronic_ISBN :
978-1-4244-2782-6
Type :
conf
DOI :
10.1109/VDAT.2009.5158087
Filename :
5158087
Link To Document :
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