• DocumentCode
    2431104
  • Title

    Development of a New Physics-Based RF Model for AlGaN/GaN HFETs

  • Author

    Yin, Hong ; Bilbro, G.L. ; Trew, R.J. ; Liu, Y. ; Kuang, W.

  • Author_Institution
    Dept. of ECE, North Carolina State Univ., Raleigh, NC
  • fYear
    2006
  • fDate
    4-5 Dec. 2006
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    A physics-based analytic model is built based on the discovery of a new zone in AlGaN/GaN HFETs that is observed in 2D device simulations, especially at high drain bias. The zone is located in the drain access region and is named the "charge deficit zone" after its particular property of a partially filled quantum well. This zone plays an important role when the HFET is under high drain bias because most of the drain voltage is dropped across it and a high lateral electric field exists within it. Good agreement is achieved in comparisons between the model and corresponding simulation results from the commercial ATLAS simulator.
  • Keywords
    aluminium compounds; circuit simulation; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; 2D device simulations; ATLAS simulator; AlGaN-GaN; HFET; RF model; heterostructure field effect transistors; Aluminum gallium nitride; Analytical models; Circuit simulation; Electrodes; Electrons; Gallium nitride; HEMTs; MODFETs; Radio frequency; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Wireless and Microwave Technology Conference, 2006. WAMICON '06. IEEE Annual
  • Conference_Location
    Clearwater Beach, FL
  • Print_ISBN
    1-4244-0849-0
  • Electronic_ISBN
    1-4244-0849-0
  • Type

    conf

  • DOI
    10.1109/WAMICON.2006.351913
  • Filename
    4161075