Title :
Screen printed multicrystalline silicon solar cells with porous silicon antireflection coating
Author :
Bilyalov, R.R. ; Groh, B. ; Lautensclager, H. ; Schindler, R. ; Schomann, F.
Author_Institution :
Fraunhofer-Inst. fur Solare Energiesysteme, Freiburg, Germany
fDate :
29 Sep-3 Oct 1997
Abstract :
The successful application of chemically etched porous silicon (PS) as an antireflection coating (ARC) for multicrystalline silicon (mc-Si) solar cell is reported. The evaluation of the Si surface after chemical etching by microscopical and optical characterization shows the great potential of PS in ARC application. For the first time the PS ARC was formed by simple chemical etching without any protection on the commercial mc-Si solar cells with screen printed contacts. The optimization of the etching parameters results in 12.3% efficiency of 10×10 cm2 mc-Si solar cell with PS ARC
Keywords :
antireflection coatings; electrical contacts; elemental semiconductors; etching; optimisation; silicon; solar cells; thick films; 12.3 percent; Si solar cells; chemical etching; microscopical characterization; multicrystalline solar cells; optical characterization; optimization; porous Si antireflection coating; screen printed contacts; Chemicals; Coatings; Etching; Metallization; Photovoltaic cells; Protection; Rough surfaces; Silicon; Surface morphology; Surface roughness;
Conference_Titel :
Photovoltaic Specialists Conference, 1997., Conference Record of the Twenty-Sixth IEEE
Conference_Location :
Anaheim, CA
Print_ISBN :
0-7803-3767-0
DOI :
10.1109/PVSC.1997.654050
