DocumentCode
2432235
Title
Stress in Si-glass anodic bonding and its effect on silicon piezoresistive pressure sensor
Author
Zheng, Xiaoshan ; Chen, Wenshan ; Chen, Xuyuan
Author_Institution
Pen-Tung Sah Micro-Nano Technol. Res. Center, Xiamen Univ., Xiamen, China
fYear
2010
fDate
20-23 Jan. 2010
Firstpage
524
Lastpage
527
Abstract
Anodic bonding between glass wafer and Si wafer are widely used for micro-electro-mechanical system (MEMS) device fabrication and packaging due to the good bonding quality. The residual stress in the bonding interface, which results from the different thermal expansion coefficients of the two wafer materials, is depended on the bonding temperature. In MEMS piezoresistive pressure sensor, the residual stress in anodic bonding, which can affect the accuracy of the device, is investigated by using the finite element method (FEM). The piezoresistive pressure sensor performance is evaluated and the residual stress effect at different temperatures is investigated in this research. The simulation results show that anodic bonding residual stress affect piezoresistive pressure sensor accuracy significantly.
Keywords
bonding processes; elemental semiconductors; finite element analysis; glass; internal stresses; microsensors; piezoresistive devices; pressure sensors; semiconductor device packaging; silicon; thermal expansion; FEM; SiO2-Si; anodic bonding interface; finite element method; glass wafer; microelectromechanical system device fabrication; microelectromechanical system device packaging; residual stress effect; semiconductor wafer; silicon piezoresistive pressure sensor; thermal expansion coefficients; FEM; anodic bonding; piezoresistive pressure sensor; residual stress;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location
Xiamen
Print_ISBN
978-1-4244-6543-9
Type
conf
DOI
10.1109/NEMS.2010.5592452
Filename
5592452
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