Title :
Stress in Si-glass anodic bonding and its effect on silicon piezoresistive pressure sensor
Author :
Zheng, Xiaoshan ; Chen, Wenshan ; Chen, Xuyuan
Author_Institution :
Pen-Tung Sah Micro-Nano Technol. Res. Center, Xiamen Univ., Xiamen, China
Abstract :
Anodic bonding between glass wafer and Si wafer are widely used for micro-electro-mechanical system (MEMS) device fabrication and packaging due to the good bonding quality. The residual stress in the bonding interface, which results from the different thermal expansion coefficients of the two wafer materials, is depended on the bonding temperature. In MEMS piezoresistive pressure sensor, the residual stress in anodic bonding, which can affect the accuracy of the device, is investigated by using the finite element method (FEM). The piezoresistive pressure sensor performance is evaluated and the residual stress effect at different temperatures is investigated in this research. The simulation results show that anodic bonding residual stress affect piezoresistive pressure sensor accuracy significantly.
Keywords :
bonding processes; elemental semiconductors; finite element analysis; glass; internal stresses; microsensors; piezoresistive devices; pressure sensors; semiconductor device packaging; silicon; thermal expansion; FEM; SiO2-Si; anodic bonding interface; finite element method; glass wafer; microelectromechanical system device fabrication; microelectromechanical system device packaging; residual stress effect; semiconductor wafer; silicon piezoresistive pressure sensor; thermal expansion coefficients; FEM; anodic bonding; piezoresistive pressure sensor; residual stress;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4244-6543-9
DOI :
10.1109/NEMS.2010.5592452