DocumentCode :
2432277
Title :
Near-field Scanning Optical Microscopy — Breaking the diffraction limit using nano light emitting probe tip
Author :
Zhang, Xiaojing John ; Hoshino, Kazunori ; Vanden Bout, D.A.
Author_Institution :
Dept. of Biomed. Eng., Univ. of Texas at Austin, Austin, TX
fYear :
2008
fDate :
21-23 July 2008
Firstpage :
89
Lastpage :
90
Abstract :
We describe optical and topographic imaging using a light emitting diode (LED) monolithically integrated on a silicon probe tip for Near-field Scanning Optical Microscopy (NSOM). The light emission resulted from a silicon dioxide layer buried between a phosphorus-doped N+ silicon layer and a gallium-doped P+ silicon region created locally at the tip by a focused ion beam (FIB). The tip was employed in a standard NSOM excitation setup. The probe successfully measured optical as well as topographic images of a chromium test pattern with imaging resolutions of 400 nm and 50 nm, respectively. The directional resolution dependence of the acquired images directly corresponds to the shape, size and polarity of the light source on the probe tip. To our knowledge, this report is the first successful near-field imaging result directly measured by such tip-embedded light sources.
Keywords :
bio-optics; focused ion beam technology; gallium; light emitting diodes; nanobiotechnology; optical microscopy; phosphorus; S:Ga; S:P; SiO2; diffraction limit; focused ion beam; light emitting diode; nanolight emitting probe tip; near field scanning optical microscopy; topographic images; Image resolution; Integrated optics; Light emitting diodes; Optical diffraction; Optical imaging; Optical microscopy; Particle beam optics; Probes; Silicon; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
IEEE/LEOS Summer Topical Meetings, 2008 Digest of the
Conference_Location :
Acapulco
ISSN :
1099-4742
Print_ISBN :
978-1-4244-1925-8
Electronic_ISBN :
1099-4742
Type :
conf
DOI :
10.1109/LEOSST.2008.4590503
Filename :
4590503
Link To Document :
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