• DocumentCode
    2433237
  • Title

    Removal of methylene blue from aqueous solution by adsorption onto NaOH-treated rambutan peel

  • Author

    Alrozi, Rasyidah ; Zamanhuri, Norashikin Ahmad ; Osman, Mohamed Syazwan

  • Author_Institution
    Fac. of Chem. Eng., Univ. Teknol. MARA, Permatang Pauh, Malaysia
  • fYear
    2012
  • fDate
    7-8 April 2012
  • Firstpage
    92
  • Lastpage
    97
  • Abstract
    Adsorption of methylene blue (MB) by NaOH-treated rambutan peel (N-RP) was examined. The adsorption experiments were carried out under different conditions of initial concentration (25-500 mg/L), solution pH 2-12 and N-RP dose (0.05-1.0 g). The influence of these parameters on the adsorption capacity was studied using the batch process. MB adsorption uptake was found to increase with increase in initial concentration and contact time. The MB adsorption was unfavourable at pH<;4. Langmuir, Freundlich and Temkin isotherm models were used to illustrate the experimental isotherms and isotherms constant. The equilibrium data were best represented by Langmuir isothem model, showing maximum monolayer adsorption capacity of 231.34 mg/g. The rates of adsorption were found to obey the rules of pseudo-second order model with good correlation. The result suggested that the N-RP would be an excellent alternative for the removal of MB by adsorption process.
  • Keywords
    adsorption; chemical engineering; dyes; sodium compounds; wastewater treatment; Freundlich isotherm models; Langmuir isotherm models; MB adsorption; N-RP dose; Temkin isotherm models; adsorption experiments; aqueous solution; batch process; isotherm constant; maximum monolayer adsorption capacity; methylene blue removal; pseudosecond order model; sodium hydroxide-treated rambutan peel; Data models; Equations; Kinetic theory; Mathematical model; Surface morphology; Surface treatment; Wastewater; NaOH-treated; adsorption; methylene blue; rambutan peel;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Business Engineering and Industrial Applications Colloquium (BEIAC), 2012 IEEE
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4673-0425-2
  • Type

    conf

  • DOI
    10.1109/BEIAC.2012.6226113
  • Filename
    6226113