DocumentCode :
2433575
Title :
Research methods of absorptivity of nanoscale layers of organometallic compounds in the processes of micromechanics
Author :
Mikhailova, D.S. ; Chesnokov, Demetrius V.
Author_Institution :
Siberian state geodesic Acad., Novosibirsk, Russia
fYear :
2009
fDate :
28-31 Oct. 2009
Firstpage :
56
Lastpage :
57
Abstract :
This paper describes the method to study the absorptivity of nanoscale layers of organometallic compounds. This method is based on frustrated total internal reflection phenomenon.
Keywords :
adsorbed layers; frustration; micromechanics; nanostructured materials; organometallic compounds; absorptivity; adsorbed layers; frustrated total internal reflection phenomenon; micromechanics; nanoscale layers; organometallic compound; Absorption; Furnaces; Laser modes; Optical fiber devices; Optical fibers; Optical reflection; Optical surface waves; Substrates; Surface emitting lasers; Transistors; Principle; frustrated total internal reflection (FTIR); optical fiber;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Modern Problems of Nanoelectronics, Micro- and Nanosystem Technologies, 2009. INTERNANO 2009. International School and Seminar on
Conference_Location :
Novosibirsk
Print_ISBN :
978-1-4244-5534-8
Type :
conf
DOI :
10.1109/INTERNANO.2009.5335634
Filename :
5335634
Link To Document :
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