An electrical method for determining the thickness of metal films and the cross-sectional area of metal lines

Author

Schafft, Harry A. ; Mayo, Santos ; Jones, Samuel N. ; Suehle, John S.

Author_Institution

Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA

fYear

1994

fDate

16-19 Oct 1994

Firstpage

5

Lastpage

11

Abstract

The electrical thickness of an aluminum-alloy metallization can be determined from resistance measurements of a van der Pauw cross structure at two temperatures, with corrections for the deviation from Matthiessen´s rule and for thermal expansion. Thickness determinations, made in this way, agree with those made with a calibrated scanning electron microscope (SEM) to within the uncertainty of the instrument. The electrical cross-sectional area of metal lines can be determined by making resistance measurements at two temperatures

Keywords

aluminium alloys; integrated circuit metallisation; integrated circuit testing; thermal expansion; thickness measurement; IC metallisation; Matthiessen´s rule; aluminum-alloy metallization; cross-sectional area; electrical method; metal lines; resistance measurements; thermal expansion; thickness determinations; van der Pauw cross structure; Area measurement; Conductivity; Electric resistance; Electrical resistance measurement; Metallization; NIST; Scanning electron microscopy; Temperature measurement; Testing; Thickness measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Integrated Reliability Workshop, 1994. Final Report., 1994 International

Conference_Location

Lake Tahoe, CA

Print_ISBN

0-7803-1908-7

Type

conf

DOI

10.1109/IRWS.1994.515820

Filename

515820