DocumentCode :
2435057
Title :
Fabrication of nanofiber-based SERS-active substrates by oxygen plasma removal of SU-8 photoresist
Author :
Mao, Haiyang ; Zhang, Yulong ; Wu, Wengang ; Xue, Chenyang
Author_Institution :
Nat. Key Lab. of Sci. & Technol. on Micro/Nano Fabrication, Peking Univ., Beijing, China
fYear :
2010
fDate :
20-23 Jan. 2010
Firstpage :
993
Lastpage :
996
Abstract :
We present for the first time an approach to fabricate surface enhanced Raman scattering (SERS)-active substrates based on nanofibers simply by removing SU-8 photoresist in oxygen plasma bombardment. Compared with Raman spectral signals of Rhodamine B on smooth silicon substrates, the intensity of those on the nanofiber-based SERS-active substrates are much more distinctive and are at least 103 folds greater. Moreover, the approach can be combined with conventional photolithography for fabricating photo-patternable SERS-active structures, together with the high hydrophilicity of the nanofibers, chemical reagents can be self-patterned in the SERS-active devices, which may have a variety of important applications in different fields.
Keywords :
nanofibres; photoresists; substrates; surface enhanced Raman scattering; Raman spectral signals; Rhodamine B; SERS-active devices; SU-8 photoresist; chemical reagents; fabrication; hydrophilicity; nanofiber-based SERS-active substrates; nanofibers; oxygen plasma bombardment; oxygen plasma removal; photo-patternable SERS-active structures; photolithography; smooth silicon substrates; surface enhanced Raman scattering; Rhodamine B; SERS; SU-8 photoresist; nanofibers; oxygen plasma;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2010 5th IEEE International Conference on
Conference_Location :
Xiamen
Print_ISBN :
978-1-4244-6543-9
Type :
conf
DOI :
10.1109/NEMS.2010.5592596
Filename :
5592596
Link To Document :
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