• DocumentCode
    2437315
  • Title

    Arc-PVD coating of powders in a microwave plasma fluidized bed

  • Author

    Pajkic, Zeljko ; Willert-Porada, Monika

  • Author_Institution
    Univ. of Bayreuth, Bayreuth
  • fYear
    2008
  • fDate
    15-19 June 2008
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Fluidized bed reactors are widely used in chemical engineering, but recently there is also increasing interest for processing particulate advanced materials in fluidized bed reactors. Examples include heat treatment, plasma-assisted surface treatment, etching, and coating. In this paper, a novel process for deposition of thin metallic and metal-nitride coatings on particulate substrates is reported. The coating process takes place in an atmospheric pressure microwave plasma fluidized bed, with the novelty that, mixed with a substrate powder, a fine solid metal powder is used as "target", serving as a source of metal vapor. Interactions of fluidized metal particles with the strong electric field lead to plasma discharges. Due to this, the metal is being evaporated readily below its melting temperature, and being deposited on the surrounding surfaces, primarily on the substrate powder. Final composition of the coatings depends also on the process gas - evidence is presented that N2 plasma yields metal nitrides (where applicable), whereas Ar/H2 plasma treatment results with pure metallic coatings. In this paper, a study of coating of a micro diamond powder with Al, Si, and Ag, is presented.
  • Keywords
    aluminium; arcs (electric); diamond; fluidised beds; plasma materials processing; plasma radiofrequency heating; powders; silicon; silver; vapour deposited coatings; Ag; Al; C; Si; advanced particulate material processing; arc PVD powder coating; argon-hydrogen process gas mixture; fine solid metal powder; fluidized bed reactors; fluidized metal particles; metal evaporation; metal vapor source; microwave plasma fluidized bed; molecular nitrogen process gas; particulate substrates; plasma discharge; pressure 1 atm; substrate powder; thin metal nitride coating deposition; thin metallic coating deposition; Atmospheric-pressure plasmas; Coatings; Electromagnetic heating; Fluidization; Inductors; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma temperature; Powders;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
  • Conference_Location
    Karlsruhe
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4244-1929-6
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2008.4590779
  • Filename
    4590779