DocumentCode
2438573
Title
New direction in nanotechnology: cluster ion beam technique
Author
Popok, V.N. ; Prasalovich, S.V. ; Campbell, E.E.B.
Author_Institution
Chalmers Univ. of Technol., Goteborg, Sweden
fYear
2003
fDate
8-12 Sept. 2003
Firstpage
523
Lastpage
525
Abstract
A brief state-of-the-art review in the field of cluster ion interaction with surface is presented. Ionised cluster beams are considered as a powerful and versatile tool for modification and processing of surfaces and near-surface layers as an alternative to ion implantation and ion assisted deposition. The main effects of cluster-surface collisions and possible applications of cluster ion beams are discussed.
Keywords
cluster tools; etching; ion beam effects; ion-surface impact; ionised cluster beam deposition; nanotechnology; sputter deposition; cluster ion interaction; cluster-surface collision; ion assisted deposition; ionised cluster beam; Acceleration; Atomic layer deposition; Atomic measurements; Doping; Fabrication; Ion beams; Ion implantation; Nanotechnology; Smoothing methods; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology, 2003. CriMiCo 2003. 13th International Crimean Conference
Conference_Location
Sevastopol, Crimea, Ukraine
Print_ISBN
966-7968-26-X
Type
conf
DOI
10.1109/CRMICO.2003.158920
Filename
1256606
Link To Document