Preparation of TiO2 thin films by reactive evaporation method

Author

Grodzicki, Milosz ; Wasielewski, Radoslaw ; Mazur, Piotr ; Zuber, Stefan ; Ciszewski, Antoni

Author_Institution

Inst. of Exp. Phys., Univ. of Wroclaw, Wroclaw, Poland

fYear

2009

fDate

25-27 June 2009

Firstpage

25

Lastpage

27

Abstract

Thin films of TiO₂ were prepared on glass substrates by reactive evaporation of TiO. Properties of the thin films were investigated under ultrahigh vacuum conditions by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). AFM topography exhibits a uniformity structure of the thin films and shows a high quality nanocrystalline structure of TiO₂ with grain size ranging from 28 nm to 35nm. The XPS Ti-2p spectra confirmed the occurrence of the 4⁺oxidation state of Ti and the O-1s spectra revealed the presence of an O^-2 photoelectron peak. The calculated O/Ti ratio in TiO₂ thin films was in the range 1.85-2.15 depending on the samples. Additional analysis of the thin films was carried out by X-ray powder diffraction (XRD).

Keywords

X-ray diffraction; X-ray photoelectron spectra; atomic force microscopy; evaporation; glass; grain size; nanostructured materials; oxidation; substrates; thin films; titanium compounds; TiO₂; X-ray photoelectron spectroscopy; X-ray powder diffraction; XPS Ti-2p spectra; atomic force microscopy; glass substrates; grain size; nanocrystalline structure; oxidation state; reactive evaporation method; thin films; ultrahigh vacuum conditions; Atomic force microscopy; Glass; Grain size; Nanostructures; Oxidation; Photoelectron microscopy; Powders; Spectroscopy; Surfaces; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Students and Young Scientists Workshop "Photonics and Microsystems", 2009 International

Conference_Location

Wernigerode

Print_ISBN

978-1-4244-4304-8

Type

conf

DOI

10.1109/STYSW.2009.5470308

Filename

5470308