DocumentCode :
2439528
Title :
Formation of CaPO4 and suppression of Ni leaching in nitinol using oxygen and sodium plasma immersion ion implantation
Author :
Yeung, K.W.K. ; Chan, Y.L. ; Lu, W.W. ; Luk, K.D.K. ; Chan, D. ; Wu, S.L. ; Liu, X.M. ; Chu, C.L. ; Chung, C.Y. ; Chu, Paul K. ; Cheung, K.M.C.
Author_Institution :
Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Kowloon
fYear :
2008
fDate :
15-19 June 2008
Firstpage :
1
Lastpage :
1
Abstract :
This study investigates the feasibility of apatite formation and the enhancement of Ni corrosion resistance in nitinol using combined sodium and oxygen plasma immersion ion implantation. X-ray photoelectron spectroscopy, scanning electron microscopy, and energy dispersive spectroscopy are used to determine the elemental depth profiles, surface morphology, chemical composition, and reactivity of the specimens. Immersion tests in simulated body fluids and cell cultures, used to assess the bioactivity and cytotoxicity of the plasma implanted samples, show better osteoblast adhesion which indicates enhanced biological performance.
Keywords :
X-ray chemical analysis; X-ray photoelectron spectra; adhesion; bioceramics; biological techniques; biomechanics; calcium compounds; cellular biophysics; corrosion resistance; nickel; plasma immersion ion implantation; scanning electron microscopy; surface morphology; CaPO4; Ni; X-ray photoelectron spectroscopy; apatite formation; biological performance; cell cultures; chemical composition; corrosion resistance; elemental depth profiles; energy dispersive spectroscopy; immersion tests; leaching; nitinol; osteoblast adhesion; plasma immersion ion implantation; scanning electron microscopy; simulated body fluids; specimen reactivity; surface morphology; Chemical elements; Corrosion; Dispersion; Immune system; Photoelectron microscopy; Plasma immersion ion implantation; Plasma simulation; Scanning electron microscopy; Spectroscopy; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2008. ICOPS 2008. IEEE 35th International Conference on
Conference_Location :
Karlsruhe
ISSN :
0730-9244
Print_ISBN :
978-1-4244-1929-6
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2008.4590899
Filename :
4590899
Link To Document :
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