• DocumentCode
    2441544
  • Title

    Compact modeling of nanoscale MOSFETs in the ballistic limit

  • Author

    Jiménez, D. ; Sáenz, J.J. ; Iñiguez, B. ; Suñe, J. ; Marsal, L.F. ; Pallarés, J.

  • Author_Institution
    Departament d´´Enginyeria Electronica, Autonomous Univ. of Barcelona, Bellaterra, Spain
  • fYear
    2003
  • fDate
    16-18 Sept. 2003
  • Firstpage
    187
  • Lastpage
    190
  • Abstract
    We present a compact model based on the Landauer transmission theory for the silicon quantum wire/well metal-oxide-semiconductor field effect transistor (MOSFET) working in the ballistic limit. This model captures the static current-voltage characteristics in all the operation regimes, below and above threshold voltage. The model provides a basic framework to account for the electronic transport in MOSFETs, being easily adaptable to gate structures as the double-gate (DG) or gate-all-around (GAA). Numerical simulations based on the proposed model have been compared with quantum mechanical self-consistent simulations and experimental results, with good agreement.
  • Keywords
    Fermi level; MOSFET; ballistic transport; nanoelectronics; quantum well devices; semiconductor device models; Landauer transmission theory; ballistic limit; barrier height; compact model; electronic transport; nanoscale MOSFET; nanoscale transistors; numerical simulations; quantum wire/well MOSFET; static current-voltage characteristics; threshold voltage; Electrodes; Electrons; Electrostatics; MOSFETs; Particle scattering; Rough surfaces; Semiconductor films; Silicon; Surface roughness; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    European Solid-State Device Research, 2003. ESSDERC '03. 33rd Conference on
  • Conference_Location
    Estoril, Portugal
  • Print_ISBN
    0-7803-7999-3
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2003.1256842
  • Filename
    1256842